5. Li Wen, Hai Wang, Liwen He, Qiuping Zhang, Weiwei Xiang, and Jiaru Chu, "Design and fabrication of microcantilever probe integrated with microplasma reactor for maskless scanning plasma etching," Sensors and Actuators A: Physical 169 (2), 362-366 (2011).
6. Jiawen Li, Qi Han, Yuhang Chen, Jiaru Chu, and Wenhao Huang, "Tunable structural colour on the basis of colloidal crystal," IET Micro & Nano Letters 6 (7), 530-533 (2011).
7. Fang Liu, Christopher S Roper, Jiaru Chu, Carlo Carraro, and Roya Maboudian, "Corrosion mechanism and surface passivation strategies of polycrystalline silicon electrodes," Sensors and Actuators A: Physical 166 (2), 201-206 (2011).
8. Hao Fu, Cunding Liu, Yong Liu, Jiaru Chu, and Gengyu Cao, "Selective photothermal self-excitation of mechanical modes of a micro-cantilever for force microscopy," Applied Physics Letters 99 (17), 173501 (2011).
9. C. Leili, W. Li, Y. Zhen, N. Dun, H. Liwen, and C. Jiaru, "A method of tip-sample distance control based on electrostatic force in maskless microplasma scanning etching," 2011 International Conference on Electronics and Optoelectronics (ICEOE 2011) (2011).
10. J. Ma, Y. Liu, Y. Liu, B. Li, and J. Chu, "Optical Correction Capability of Piezoelectric Deformable Mirror Based on Unimorph Microactuator Array," SPIE, Vol. 8191, p. 81910Y (2011).
11. Xiang Wang, Jijun He, Jianqiang Ma, Junjun Ding, Jiaru Chu, and Wenhao Huang, "Resolution improvement of femtosecond laser induced two-photon polymerization based on phase filtering," Optical Engineering 50 (5), 054302-054302-054306 (2011).
12. W. W. Xiang, L. Wen, Q. P. Zhang, and J. R. Chu, "Fabrication of Nano-Aperture Hollow Tip Array for Microplasma Etching," Key Engineering Materials Vol. 483 (2011).
13. Y. Zhen, W. Li, C. Leili, H. Liwen, and C. Jiaru, "Calculation and Simulation of the Bending Deformation of Multilayer Thin Films Microcantilever Integrated with the Microplasma Reactor," 2011 International Conference on Electronics and Optoelectronics (ICEOE 2011) (2011).
14. L. Wen, Z. Yuan, L. L. Cheng, L. W. He, H. Wang, and J. R. Chu, "Characteristics of inverted pyramidal microdischarge devices operating in CHF3 and CHF3/Ar for maskless microplasma etching," TRANSDUCERS,11, pp. 454-457 (2011).
15. W. Li, Z. Hongjiang, Y. Zheng, C. Jiaru, and W. Hai, "Simulation and experiments of intrinsic bending of multilayer microcantilever for maskless scanning plasma etching," Proceedings of the 2011 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS 2011) (2011).